Process for depositing a layer of material over a substrate

ABSTRACT

An electroplating system ( 30 ) and process makes electrical current density across a semiconductor device substrate ( 20 ) surface more uniform during plating to allow for a more uniform or tailored deposition of a conductive material. The electrical current density modifiers ( 364  and  37 ) reduce the electrical current density near the edge of the substrate ( 20 ). By reducing the current density near the edge of the substrate ( 20 ), the plating becomes more uniform or can be tailored so that slightly more material is plated near the center of the substrate ( 20 ). The system can also be modified so that the material that electrical current density modifier portions ( 364 ) on structures ( 36 ) can be removed without having to disassemble any portion of the head ( 35 ) or otherwise remove the structures ( 36 ) from the system. This in-situ cleaning reduces the amount of equipment downtime, increases equipment lifetime, and reduces particle counts.

FIELD OF THE INVENTION

This invention relates in general to processes and systems fordepositing layers on substrates, and more particularly, processes andsystems for electroplating metal-containing layers on those substrates

BACKGROUND OF THE INVENTION

Currently semiconductor devices are requiring higher current densitiesfor operation while still resisting electromigration or otherreliability problems Copper is being investigated as being a possiblealternative to current aluminum or aluminum-copper metalization. One ofthe most promising methods of depositing copper on a substrate is byusing plating methods, such as electroplating

FIG. 1 includes an illustration of a cross-section view of a prior artelectroplating system 10. The system 10 includes a chamber 11 with anoutlet port 102. The system further includes a cup 12 that has an inletport 112 for receiving a plating fluid and a diffuser 13 within cup 12.An anode 14 lies between the cup 12 and the diffuser 13 The system 10further includes a head 15 that has a turntable 151 and clamp fingers152. The clamp fingers 152 are the cathode for the system 10 and aretypically made of platinized titanium. In the operation of the system10, the plating solution 19 enters the cup 12 through the inlet port112, flows by the anode 14, at which point ions from the anode 14 aredissolved into the plating solution 19. The plating solution 19continues to flow up through the diffuser 13 to reach the substrate 20.The plating solution 19 eventually flows over the sides of the cup 12,down between the walls of the cup 12 and the chamber 11, and through theoutlet port 102. The anode 14 and clamp fingers 152 are biased to platethe substrate 20 .

During operation of this prior art system 10, nonuniform depositiontypically occurs as illustrated in FIG. 2. As shown in FIG. 2, thesemiconductor device substrate 20 has a base material 22 that can be aninsulator, a conductor, or a combination of insulators and conductorswith a conductive seed layer 24 overlying the base material 22. Platedmaterial 26 is plated onto the seed layer 24. Note that the substrate 20is loading into system 10 upside down. In FIG. 2, the substrate has beenturned upright so that layer 26 faces the top of FIG. 2. As shown inFIG. 2, the deposition of the plated material 26 is typically thickernear the edge of the substrate 20 and thinner near its center point.This nonuniform deposition causes problems, particularly if the platedmaterial 26 is to be chemically mechanically polished. Polishingtypically removes material faster near the center and slower near theedges of the substrate. The combination of the thicker portion of theplated material 26 near the edge of the substrate 20 and the lowerpolishing rate near the edge accentuates the nonuniformity of the platedmaterial 26 after polishing. During polishing, too much of theunderlying base material 22 is removed due to non-ideal polishingselectivity or a ring of residual material is left around the edge ofthe substrate 20, where neither are desired.

Electrical robber plates are used in plating printed circuit boardsubstrates. The robber plate is attached to the board and isdestructively removed by cutting the piece of the board having therobber plate.

A need exists to create a system that is either more uniform indeposition or is capable of plating slightly more material near thecenter of the substrate compared to its edges to compensate for theaccelerated polishing typically seen near the center of a substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention is illustrated by way of example and notlimitation in the accompanying figures, in which like referencesindicate similar elements, and in which:

FIG. 1 includes an illustration of a cross-sectional view of a prior artplating system;

FIG. 2 includes an illustration of a cross-sectional view of a portionof a semiconductor substrate after a material has been plated onto thesubstrate using a prior art method;

FIG. 3 includes an illustration of a cross-section view of anelectroplating system in accordance with an embodiment of the presentinvention;

FIG. 4 includes an illustration of a top view of the plating headillustrating the relationship between the substrate and the clampstructures in according with an embodiment of the present invention;

FIG. 5 includes an illustration of a cross-sectional view of a portionof a semiconductor device substrate after plating a material using anembodiment of the present invention; and

FIG. 6 includes an illustration of a cross-sectional view of a platingsystem with an anode design in accordance with another embodiment of thepresent invention.

Skilled artisans appreciate that elements in the figures are illustratedfor simplicity and clarity and have not necessarily been drawn to scale.For example, the dimensions of some of the elements in the figures areexaggerated relative to other elements to help to improve understandingof embodiment(s) of the present invention.

DETAILED DESCRIPTION

A new electroplating system and process makes the electrical currentdensity across a semiconductor device substrate surface more uniformduring plating to allow for a more uniform or tailored deposition of aconductive material. The electrical current density modifiers reduce theelectrical current density near the edge of the substrate where theplating rate would otherwise be the highest. By reducing the currentdensity near the edge of the substrate, the plating becomes more uniformor can be tailored so that slightly more material is plated near thecenter of the substrate. The system can also be modified so that thematerial that deposits on clamping structures can be removed withouthaving to disassemble any portion of the head or otherwise remove thearc-shaped electrical current density modifier from the system. Thisin-situ cleaning reduces the amount of equipment downtime, increasesequipment lifetime, and reduces particle counts.

FIGS. 3 and 4 includes illustrations of an electroplating system 30 inaccordance with an embodiment of the present invention. The system 30 issimilar to system 10, however, system 30 includes clamp structures 36with clamp portions 362 (cathode or second electrode) and arc-shapedelectrical current density modifier portions 364, and a ring-shapedelectrical current density modifier 37. The system 30 includes a chamber31 with an outlet port 302, and a cup 32 with an inlet port 312 forreceiving a plating fluid. Within cup 32, a diffuser 33 creates morelaminar flow of the plating solution (ionic liquid) 39 through the cup32. An anode 34 (first electrode) lies between the cup 32 and thediffuser 33. The anode 34 typically includes the material that will beplated onto a semiconductor device substrate 20.

The system 30 further includes a head 35 that has a turntable 351 andclamp structures 36, and a ring-shaped modifier 37. The turntable 351,diffuser 33, cup 32, and chamber 31 include a non-conductive material,such as polyethylene, fluorocarbons (i.e., Teflon™), or the like. Thesematerials reduce the likelihood of any current conduction or any adversereactions with the plating solution. The anode 14, the clamp structures36 and ring-shaped modifiers 37, any conductive layers that are on thesubstrate 20, such as the conductive seed layer 24, should be the onlyconductive materials in contact with the plating solution 39.

FIG. 4 includes an illustration of a top view of a semiconductor devicesubstrate 20 being held onto the turntable 351 with clamp structures 36.Each of the structures 36 includes a clamp portion 362 and an electricalcurrent density modifier portion 364. The clamp portion 362 and theelectrical current density modifier portion 364 are conductive. Theportion 364 is at least one mm wider and extends at least one mm furthertoward the anode 34 compared to the part of portion 362 that liesbetween the substrate 20 and the anode 34. In this particularembodiment, the arc length of each of the portions 364 is in a range ofapproximately 5-50 mm and is nominally 25 mm. The height of each of thearc-shaped modifier portions 364 is in a range of approximately 5-15 mmand is nominally 10 mm. The thickness of each of the portions 364 is inthe range of approximately 2-6 mm thick. The ring-shaped modifier 37 isconductive and positioned so that there is a gap in a range ofapproximately 5-15 mm between the structure 36 and the ring-shapedmodifier 37. Similar to portions 364, modifier 37 extends further towardthe anode 34. Modifier 37 has a circumference that is larger than thesum of the widths of the portions 362. In other words, modifier 37 is“wider” than the portions 362.

The ring-shaped modifier 37 generally has a height in a range ofapproximately 5-25 mm and a thickness in a range of 10-15 microns. Inone embodiment, the ring-shaped modifier 37 is positioned near the topof the cup 32. The ring-shaped modifier 37 is located anywhere along thecup 32 between the diffuser 39 and the top of the cup 32. Typically thering-shaped modifier 37 is attached to the cup 12. The ring-shapedmodifier 37 can be a continuous ring or could be segmented along thewalls of the cup 32. In one particular embodiment, both the structures36 and ring-shaped modifier 37 are made of the same material as what isbeing plated onto the substrate 20 to reduce the likelihood ofcontamination of the plating solution 39. If a copper material is beingplated, the structures 36, ring-shaped modifier 37 and anode 34 are madeof copper. However, in alternative embodiments, different materialscould be used. The cathode (second electrode) for the system 30 includesthe clamp portions 362. The portions 364 and the ring-shaped modifier 37are types of electrical current density modifiers for the system 30 andare spaced apart from the substrate 20.

A specific example of plating copper is discussed below. Although manydetails are given, the information is meant to illustrate and not limitthe scope of the invention. In the operation of the system 30, theplating solution 39 enters the cup 32 through the inlet port 312. Theplating solution includes copper (Cu), copper sulfate (Cu₂SO₄), sulfuricacid (H₂SO₄), and chloride ions, such as those from HCl. The platingsolution 39 flows past the anode 34, at which point ions from the anode34 are dissolved into the plating solution 39. The plating solution 39continues to flow up through the diffuser 33 to reach the substrate 20.The plating solution 39 eventually flows over the sides of the cup 32,down between the walls of the cup 32 and the chamber 31, and through theoutlet port 302.

During the first portion of the process, the anode 34 is conditioned byforming a copper oxide type film on at least a portion of the anode 34,particularly but not limited to the portion of the anode 34 directlyfacing the structures 36. After conditioning, additives are added to thesolution 39 before a semiconductor substrate contacts the platingsolution 39.

A conductive seed layer is formed over the primary surface (device side)of substrate 20. In this example, the substrate 20 is a circular wafer.The conductive seed layer 24 promotes plating onto the substrate 20. Theconductive seed layer 24 typically includes a refractory metalcontaining material, such as titanium, tantalum, titanium nitride,tantalum nitride, and the like. The substrate 20 with the conductiveseed layer 24 is then mounted onto the turntable 351 and is held inplace by the clamp portions 362 of the structures 36. The head 35 isthen lowered such that a portion of the structures 36 and the seed layer24 is in contact with the plating solution 39. Caution should beexercised to keep the backside (unexposed) surface of the substrate 20from contacting the solution 39.

During plating, the anode 34, structures 36, and ring-shaped modifier 37are biased to deposit a layer 56 of plating material as shown in FIG. 5.Although the anode 34, structures 36, and ring-shaped modifier 37 canhave positive or negative biasing polarities or be electricallygrounded, the anode 44 is at a more positive potential compared to thestructures 36 and ring-shaped modifier 37. In one particular embodiment,both the ring-shaped modifier 37 and the structures 36 are atapproximately the same potential. In another embodiment, the ring-shapedmodifier 37 is biased such that the potential on the structures 36 isbetween the potential of the anode 34 and the ring-shaped modifier 37.The biasing conditions can be held substantially constant during platingor varied over time (i.e., pulsed (square wave), sawtooth, sinusoidal,or the like). As used in this specification, biasing does not includeelectrically floating that component but can include placing one of thesystem components at ground potential.

For either embodiment, biasing the structures 36 and the ring-shapedmodifier 37 help reduce the current density at the edge which in turnreduces the plating rate near the edge of the substrate 20 compared toif no electrical current density modifiers are used. The plating occursuntil a desired thickness of the plated material 26 is formed. In oneembodiment, this is typically in a range of approximately 6,000-15,000angstroms. Unlike the prior art, the thickness of the plated material ismore uniform or can be slightly thicker in the middle of the substrate20 as illustrated in FIG. 5. Note that in FIG. 5, the substrate 20 hasbeen turned over so that the plated material 26 faces the top of FIG. 5.The potential on the electrical current density modifiers are adjustedto achieve the desired uniformity results. Layer 56 can be depositedsuch that the difference in thickness of the layer 56 over thecenterpoint and a point within ten millimeters from the edge of thesubstrate is no more five percent of the thickness of layer 56 over thecenterpoint. During plating, the operational parameters except those asexpressly stated are those that are conventionally used in the art.

The electric current density modifiers are not destructively removedfrom the substrate 20 as is done with the prior art thieves that are incontact with the printed circuit boards during plating. Subsequentprocessing must still be performed while the substrate 20 is in waferform. If the electric current modifiers were in contact with thesubstrate 20 and were destructively removed, subsequent processing stepswould be nearly impossible to perform because the substrate 20 would nothave an essentially circular shape. The broken substrate would generateparticles, have sharp edges, and would likely fracture further duringsubsequent processing steps which lowers yield.

After plating, processing is performed to form a substantially completeddevice. Steps can include chemical-mechanical polishing the layer 56,forming additional insulating and interconnect layers, if needed, andforming a passivation layer over the uppermost interconnect layer. Ifthe layer 56 is used for solder bumps, layer 56 has a thickness over thecenterpoint of the substrate that is in a range of approximately 40-160microns and is patterned by etching.

After the plating is completed, a different substrate can be plated orthe structures 36 can be cleaned by removing at least a portion of theplating material that is deposited on structures 36 when the platedlayer 56 is deposited on the substrate 20. Cleaning can be accomplisheddifferent ways. In one embodiment, the cleaning can occur by biasing thestructures 36 at a more positive potential compared to the anode 34. Instill another embodiment, the structures 36 are biased at a morepositive potential compared to the ring-shaped modifier 37. In thisparticular embodiment, the anode 34 electrically floats. If the anode 34electrically floats, the film that is created on the anode 34 duringconditioning will remain essentially undisturbed during the cleaningprocess. If the anode 34 is not allowed to float, the film should beaffected and will need to be conditioned. After the cleaning step,additional substrates can be processed.

The system 30 can also be used to plate other materials including goldand nickel. Additionally, the system can be used to deposit alloys. Forexample conductive bumps used in semiconductor devices for ball gridarrays. The conductive bumps typically include a lead-tin alloy. Leadhas an oxidation potential of +0.126 volts, and tin has an oxidationpotential of +0.136. Therefore, tin is more readily oxidized compared tolead. The anode 34 should comprise the metallic element that is morereadily oxidized and not the other metallic element. Otherwise, theanode 34 may become pitted after plating substrates. In this particularinstance, the anode 34 should include tin but not lead. The platingsolution 39 will include lead and tin in both elemental (reduced) andionic (oxidized) states. The deposition parameters, particularlyconcentrations of lead and tin in the plating solution and biasingconditions for the anode 34, structures 36, and ring-shaped modifier 37,can be changed to modify the composition of the alloy. The alloy canhave a substantially uniform or graded (discretely or continuously)composition.

In still another embodiment, the system 30 is used to deposit otherelectroactive materials onto the substrate 20. In this application, thematerial would be negatively charged, and therefore, the substrate 20and structures 36 now becomes the anode and what used to be the anode 34becomes the cathode. In this manner the current direction within theplating solution 39 is essentially reversed.

The present invention includes other embodiments. In one particularembodiment, the structures 36 are modified such that the clamp portions362 and the portions 364 are separate pieces. In this case, the portions364 and the clamp portions 362 are attached to the turntable asindividual components. In other embodiments, the portions 364 arepermanently attached to the clamp portions 362 or be a removable portionthat could be taken off the clamp portions, from time to time.

During plating, the structures 36 can be completely or partiallysubmerged within the plating solution 39. The shapes of one or both ofthe electrical current density modifiers should match the shape of theedge of the substrate 20. For example, the portions 364 are arc-shapedportions, and all points along the inner edge of those arc-shapedportions 364 are substantially equal distances from the substrate 20. Ifthe substrate 20 is rectangular with straight edges, the arc-shapedmodifier portions would have inner edges facing the substrate 20 and aresubstantially parallel to the corresponding edge of the substrate 20.

Alternative designs for the ring-shaped modifier 37 are also possible.In other embodiments, the ring-shaped modifier 37 extends above the topof the cup 32. For example, the ring-shaped modifier 37 could includecastellated edges that allow the plating solution 39 to flow between thecastellated edges and out of the cup 32. In this manner, the platingsolution 39 is not in contact with the upper portion of the ring-shapedmodifier 37. This would be most likely to be used if a segmentedring-shaped modifier would be used for plating. Similar to a previousembodiment, the shape of the ring-shaped modifier 37 generally should beabout the same as the cup 32, which generally matches the shape of thesubstrate 20. In the case of a circular substrate 20, the ring-shapedmodifier 37 and the cup 32 have circular shapes. If the substrate 20 isrectangular, the ring-shaped modifier 37 and the cup 32 also haverectangular shapes.

In still other embodiments, only portions of ring-shaped modifier 37 areconductive. In one particular embodiment, one segment of the ring-shapedmodifier 37 has its upper half conductive and an adjacent portion of thering-shaped modifier 37 would have its lower half conductive. In stillanother embodiment, all the upper portion or all the lower portion orany combination thereof is conductive. In any event, the positioning ofthe ring-shaped modifier 37 should be made such that the uniformity ofplating is optimized.

The system 30 can be operated with only the structures 36 or thering-shaped modifier 37 as the electrical current density modifiers. Theuse of both electrical current density modifiers increases the abilityto better control the electrical current density during plating, andtherefore, allow more control over the variation in thickness of theplated material 56 over the substrate 20

In yet another embodiment, the anode shape can be modified to optimizethe current density so that it is more uniform across the surface of thewafer. As illustrated in FIG. 6, a conical-shaped anode 64 has a taperededge. This changes the current density near the substrate 20. Clearly,other shapes are possible.

In the foregoing specification, the invention has been described withreference to specific embodiments. However, one of ordinary skill in theart appreciates that various modifications and changes can be madewithout departing from the scope of the present invention as set forthin the claims below. Accordingly, the specification and figures are tobe regarded in an illustrative rather than a restrictive sense, and allsuch modifications are intended to be included within the scope ofpresent invention. In the claims, means-plus-function clause(s), if any,cover the structures described herein that perform the recitedfunction(s). The mean-plus-function clause(s) also cover structuralequivalents and equivalent structures that perform the recitedfunction(s).

What is claimed is:
 1. A process for depositing a layer of material overa substrate comprising: placing the substrate into a plating systemincluding: a first electrode; a second electrode electrically connectedto the substrate, wherein: the second electrode includes clamp portionsand electrical current density modifier portions; each of the electricalcurrent density modifier portions lies closer to the first electrodecompared to its corresponding clamp portion; and an ionic liquid,wherein the ionic liquid contacts the first electrode, the secondelectrode, and the substrate; biasing the first electrode to a firstpotential and the second electrode to a second potential to deposit thelayer of material on the substrate, wherein the first potential isdifferent from the second potential; and removing the substrate from theplating system.
 2. The process of claim 1, wherein the substrate has acircular shape and each of the electrical current density modifierportions has an arc shape.
 3. The process of claim 1, wherein biasingcomprises generating a pulsed potential difference that variesperiodically over time.
 4. The process of claim 1, wherein biasingdeposits the layer of material selected from a group consisting ofcopper, gold, and nickel.
 5. The process of claim 1, wherein theelectrical current density modifier portions are not part of the clampportions.
 6. The process of claim 1, wherein the first electrode has across-section which is conical in shape.
 7. The process of claim 1,wherein during biasing, the layer is deposited over a first point closerto a center of the substrate to a first thickness and over a secondpoint closer to an edge of the substrate to a second thickness that isno more than the first thickness.
 8. The process of claim 1, wherein,cumulatively, the electrical current density modifier portions surroundpart, but not all, of the substrate.
 9. The process of claim 8, whereinremoving the portion of the layer of material comprises electricallyfloating the first electrode.
 10. The process of claim 1, wherein: eachof the electrical current density modifier portions has a firstdimension extending in a first direction; the first direction is towardsthe first electrode; and the first dimension is in a range ofapproximately 5-15 mm.
 11. The process of claim 10, wherein: each of theelectrical current density modifier portions has a second dimensionextending in a second direction; the second direction is perpendicularto the first direction; and the second dimension is in a range ofapproximately 5-50 mm.
 12. The process of claim 1, wherein: the platingsystem further includes a conductor spaced apart from each of the firstelectrode, the second electrode, and the substrate; and furthercomprising biasing the conductor to a third potential and the secondelectrode to a fourth potential after removing the substrate from theplating system.
 13. The process of claim 12, wherein the first electrodeelectrically floats and the third potential is lower than the fourthpotential.
 14. The process of claim 1, wherein: the plating systemfurther includes a conductor spaced apart from each of the firstelectrode, the second electrode, and the substrate; and transferring atleast a portion of the layer of material from the second electrode tothe conductor after removing the substrate from the plating system. 15.A process for depositing a layer of material over a substratecomprising: placing the substrate into a plating system including: acup; a first electrode within the cup; a second electrode electricallyconnected to the substrate; a conductor that is spaced apart from eachof the substrate, the first electrode, and the second electrode; and anionic liquid, wherein the ionic liquid contacts the first electrode, thesecond electrode, the substrate, and the conductor; biasing the firstelectrode to a first potential and the second electrode to a secondpotential, wherein: the layer of material is deposited on the substrateand second electrode; and the first potential is different from thesecond potential; removing the substrate from the plating system; andbiasing the conductor to a third potential and the second electrode to afourth potential after removing the substrate from the plating system,wherein the third potential is lower than the fourth potential, andwherein at least a portion of the layer of material on the secondelectrode is transferred to the conductor.
 16. The process of claim 15,wherein during biasing the conductor, the first electrode electricallyfloats.
 17. The process of claim 15, further comprising rotating thesubstrate with respect to the first electrode during the step of biasingthe first electrode.
 18. The process of claim 15, wherein biasing thefirst electrode to the first potential deposits the layer of materialthat is an alloy including a first metallic element and a secondmetallic element that is different from the first metallic element. 19.The process of claim 18, wherein: the first electrode comprises thefirst metallic element and not the second metallic element; the firstmetallic element has a higher oxidation potential compared to the secondmetallic element; and the ionic liquid includes ions of the secondmetallic element.
 20. The process of claim 15, wherein the substrate isa semiconductor device substrate.
 21. The process of claim 15, whereinthe conductor has a ring shape and is attached to the cup.
 22. Theprocess of claim 21, wherein the conductor is segmented.
 23. The processof claim 15, further comprising a step of rotating the conductor withrespect to the first electrode during the step of biasing.
 24. Theprocess of claim 15, wherein during biasing the first electrode, thelayer is deposited over a first point closer to a center of thesubstrate to a first thickness and over a second point closer to an edgeof the substrate to a second thickness that is no more than the firstthickness.
 25. The process of claim 24, wherein the first thickness isgreater than the second thickness.
 26. The process of claim 15, whereinthe substrate has circular shape and the conductor has a ring shape. 27.The process of claim 15, wherein: the second electrode is part of ahead; the conductor is spaced apart from the head; placing the substrateinto the plating system further includes: mounting the substrate ontothe head; and contacting the head with the ionic liquid.
 28. The processof claim 15, wherein: the conductor is completely submerged within theionic liquid; the conductor has a thickness and a length; the thicknessis measured in a direction substantially parallel to a primary surfaceof the substrate; the length is measured in a direction substantiallyperpendicular to the primary surface of the substrate; and the length isgreater than the thickness.
 29. A process for depositing a layer ofmaterial over a substrate comprising: placing the substrate into aplating system including: a cup; a first electrode within the cup; asecond electrode electrically connected to the substrate; a conductorthat is spaced apart from each of the substrate, the first electrode,and the second electrode; and an ionic liquid, wherein the ionic liquidcontacts the first electrode, the second electrode, the substrate, andthe conductor; biasing the first electrode to a first potential and thesecond electrode to a second potential, wherein: the layer of materialis deposited on the substrate and second electrode; and the firstpotential is different from the second potential; removing the substratefrom the plating system; and transferring at least a portion of thelayer of material from the second electrode to the conductor.
 30. Theprocess of claim 29, wherein transferring comprises electricallyfloating the first electrode and biasing the conductor to a thirdpotential and the second electrode to a fourth potential.
 31. Theprocess of claim 30, wherein the third potential is lower than thefourth potential.
 32. The process of claim 29, wherein: the secondelectrode is part of a head; the conductor is spaced apart from thehead; placing the substrate into the plating system further includes:mounting the substrate onto the head; and contacting the head with theionic liquid.
 33. The process of claim 29, wherein: the conductor iscompletely submerged within the ionic liquid; the conductor has athickness and a length; the thickness is measured in a directionsubstantially parallel to a primary surface of the substrate; the lengthis measured in a direction substantially perpendicular to the primarysurface of the substrate; and the length is greater than the thickness.34. A process for depositing a layer of material over a substratecomprising: placing the substrate into a plating system including: afirst electrode; a second electrode electrically connected to thesubstrate; a conductor that is spaced apart from each of the substrate,the first electrode, and the second electrode; and an ionic liquid,wherein the ionic liquid contacts the first electrode, the secondelectrode, the substrate, and the conductor; biasing the first electrodeto a first potential and the second electrode to a second potential,wherein: the layer of material is deposited on the substrate and secondelectrode; and the first potential is different from the secondpotential; removing the substrate from the plating system; andtransferring at least a portion of the layer of material from the secondelectrode to the conductor.
 35. The process of claim 34, wherein duringthe transferring, the first electrode electrically floats.
 36. Theprocess of claim 34, wherein during the transferring, the conductor isbiased to a third potential and the second electrode is biased to afourth potential.
 37. The process of claim 36, wherein during thetransferring, the third potential is lower than the fourth potential.38. The process of claim 34, further comprising rotating the substratewith respect to the first electrode during the step of biasing the firstelectrode.
 39. The process of claim 34, wherein biasing the firstelectrode to the first potential deposits the layer of material that isan alloy including a first metallic element and a second metallicelement that is different from the first metallic element.
 40. Theprocess of claim 39, wherein: the first electrode comprises the firstmetallic element and not the second metallic element; the first metallicelement has a higher oxidation potential compared to the second metallicelement; and the ionic liquid includes ions of the second metallicelement.
 41. The process of claim 34, wherein the substrate is asemiconductor device substrate.
 42. The process of claim 34, wherein:The plating system further comprises a cup; and the conductor has a ringshape and is attached to the cup.
 43. The process of claim 42, whereinthe conductor is segmented.
 44. The process of claim 34, furthercomprising a step of rotating the conductor with respect to the firstelectrode during the step of biasing.
 45. The process of claim 34,wherein during biasing the first electrode, the layer is deposited overa first point closer to a center of the substrate to a first thicknessand over a second point closer to an edge of the substrate to a secondthickness that is no more than the first thickness.
 46. The process ofclaim 45, wherein the first thickness is greater than the secondthickness.
 47. The process of claim 34, wherein the substrate hascircular shape and the conductor has a ring shape.
 48. The process ofclaim 34, wherein: the second electrode is part of a head; the conductoris spaced apart from the head; placing the substrate into the platingsystem further includes: mounting the substrate onto the head; andcontacting the head with the ionic liquid.
 49. The process of claim 34,wherein: the conductor is completely submerged within the ionic liquid;the conductor has a thickness and a length; the thickness is measured ina direction substantially parallel to a primary surface of thesubstrate; the length is measured in a direction substantiallyperpendicular to the primary surface of the substrate; and the length isgreater than the thickness.